logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10395943 B1

PDFFull Text
Date of Patent:
Aug. 27, 2019

Filed:

Feb. 15, 2016

Patterning method, method for producing processed substrate, method for producing optical component, method for producing circuit board, and method for producing electronic component

Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Toshiki Ito, Kawasaki, JP;

Takeshi Honma, Tokyo, JP;

Shiori Yonezawa, Tokyo, JP;

Tomonori Otani, Iruma, JP;

Kazumi Iwashita, Kobe, JP;

Assignee:

Canon Kabushiki Kaisha, Tokyo, JP;

Attorney:

Canon U.S.A. Inc., IP Division

Primary Examiner:

Binh X Tran

Int. Cl.
CPC ...
H01L 21/311 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); G03F 7/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); G03F 7/0002 (2013.01); G03F 7/027 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/31116 (2013.01);
Abstract

To provide a patterning method for forming a desired pattern in a reverse process. A patterning method includes a reverse process. A photocurable composition contains at least a polymerizable compound (A) component and a photopolymerization initiator (B) component. The (A) component has a mole fraction weighted average molecular weight of 200 or more and 1000 or less. The (A) component has an Ohnishi parameter (OP) of 3.80 or more. The Ohnishi parameter (OP) of the (A) component is a mole fraction weighted average of N/(N−N), wherein N denotes a total number of atoms in a molecule, Ndenotes a number of carbon atoms in the molecule, and Ndenotes a number of oxygen atoms in the molecule.

Find Patent Forward Citations

Ito, Toshiki. (2019). Patterning method, method for producing processed substrate, method for producing optical component, method for producing circuit board, and method for producing electronic component (U.S. Patent No. 10395943). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10395943

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…