The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jul. 31, 2018
Canon Kabushiki Kaisha, Tokyo, JP;
Ryo Koizumi, Saitama, JP;
Tadao Nakamura, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an exposure method for repeatedly performing an exposure process for exposing a substrate via a projection optical system, the method comprising a first exposure process for measuring optical characteristics of the projection optical system, and exposing the substrate while correcting the optical characteristics based on a result of the measurement; a second exposure process for exposing the substrate while correcting the optical characteristics based on a result of estimating the optical characteristics by a prediction formula, wherein the first exposure process is repeatedly performed, and the second exposure process is started after the first exposure process where it is judged that the determined coefficient of the prediction formula has converged.