The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jun. 23, 2017
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Issei Suzuki, Kawasaki, JP;
Masahito Yahagi, Kawasaki, JP;
Yuki Fukumura, Kawasaki, JP;
Kazuaki Ebisawa, Kawasaki, JP;
Yoshitaka Komuro, Kawasaki, JP;
Toshikazu Takayama, Kawasaki, JP;
Takashi Kamizono, Kawasaki, JP;
Tatsuya Fujii, Kawasaki, JP;
TOYKO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Abstract
A resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the developing solution changes under the action of an acid and an acid generator represented by general formula (b1). In general formula (b-1), Rrepresents an aromatic hydrocarbon group having at least one alkyl group having 3 or more carbon atoms as a substituent, Yrepresents a divalent linking group containing an ester bond (—C(═O)—O— or —O—C(═O)—), Vrepresents an alkylene group, a fluorinated alkylene group, or a single bond, m is an integer of 1 or more, and Mrepresents an m-valent organic cation.R—Y—V—CF—SO(M)  (b1)