The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Oct. 17, 2017
Applicant:
Raytheon Company, Waltham, MA (US);
Inventor:
David N. Sitter, Jr., Torrance, CA (US);
Assignee:
RAYTHEON COMPANY, Waltham, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 17/06 (2006.01); G02B 13/14 (2006.01); G02B 23/02 (2006.01);
U.S. Cl.
CPC ...
G02B 17/0663 (2013.01); G02B 13/146 (2013.01); G02B 23/02 (2013.01);
Abstract
Optimal angular field mappings that provide the highest contrast images for back-scanned imaging are given. The mapping can be implemented for back-scanned imaging with afocal optics including an anamorphic field correcting assembly configured to implement a non-rotationally symmetric field mapping between object space and image space to adjust distortion characteristics of the afocal optics to control image wander on a focal plane array. The anamorphic field correcting assembly can include one or more mirrors having non-rotationally symmetric aspherical departures.