The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Dec. 17, 2014
Lpe S.p.a., Baranzate (MI), IT;
Francesco Corea, Baranzate, IT;
Danilo Crippa, Baranzate, IT;
Laura Gobbo, Baranzate, IT;
Marco Mauceri, Baranzate, IT;
Vincenzo Ogliari, Baranzate, IT;
Franco Preti, Baranzate, IT;
Marco Puglisi, Baranzate, IT;
Carmelo Vecchio, Baranzate, IT;
LPE S.P.A., Baranzate (MI), IT;
Abstract
A reaction chamber of a reactor for epitaxial growth includes a wall () with a recess and a susceptor () comprising a body and a relief. The body is placed in said recess in a rotational manner with respect to said wall (). The chamber includes a discoid supporting element (), having a shape adapted to be laid stably on said relief, having a size such to protrude radially from said relief and adapted to support one or more substrates to be subjected to epitaxial growth. The chamber also includes a flat covering () located over said wall () and a hole () at said discoid supporting element (). The shape of said hole () corresponds to the shape of said discoid supporting element (). The covering () has at least one hollow guide () for the passage of a device () for loading/unloading said discoid supporting element (), wherein said hollow guide () extends from an edge of said covering () to said hole ().