The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Mar. 28, 2017
Applicant:
Nbd Nanotechnologies, Inc., Danvers, MA (US);
Inventors:
Cheng Diao, Auburndale, MA (US);
Esra Altinok, Medford, MA (US);
Bong June Zhang, Chestnut Hill, MA (US);
Perry L. Catchings, Sr., Roxbury, MA (US);
Assignee:
NBD NANOTECHNOLOGIES, INC., Lexington, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/18 (2006.01); C08K 5/549 (2006.01); C07F 7/21 (2006.01);
U.S. Cl.
CPC ...
C07F 7/1804 (2013.01); C07F 7/21 (2013.01); C08K 5/549 (2013.01);
Abstract
Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.