The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Jan. 05, 2017
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Yumi Sato, Kurashiki, JP;
Masahiro Yamane, Kurashiki, JP;
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Abstract
There is provided a method for producing hydroxypivalaldehyde (HPA), including steps (i) to (iii) below in this order, The method enables HPA to be mass-produced and the collecting ratio of HPA to be improved while selectively removing impurities other than water contained in HPA, specifically IBAL and the like. According to the method for producing HPA as mentioned above, it is possible to reduce the content of neopentyl glycol-isobutyrate, isobutylaldehyde-hydroxypivalaldehyde-acetal, and isobutylaldehyde-hydroxypivalaldehyde-aldol as specific impurities byproduced from HPA.