The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Jul. 09, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Michael Engel, Ossining, NY (US);

Mathias B. Steiner, Rio de Janeiro, BR;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/02 (2006.01); H01L 31/0232 (2014.01); H01L 31/109 (2006.01); H01L 31/0384 (2006.01); H01L 31/18 (2006.01); H01L 31/0216 (2014.01); H01L 31/101 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0232 (2013.01); H01L 31/02162 (2013.01); H01L 31/02327 (2013.01); H01L 31/0384 (2013.01); H01L 31/03845 (2013.01); H01L 31/109 (2013.01); H01L 31/1013 (2013.01); H01L 31/18 (2013.01);
Abstract

A method of forming a wavelength detector that includes forming a first transparent material layer having a uniform thickness on a first mirror structure, and forming an active element layer including a plurality of nanomaterial sections and electrodes in an alternating sequence atop the first transparent material layer. A second transparent material layer is formed having a plurality of different thickness portions atop the active element layer, wherein each thickness portion correlates to at least one of the plurality of nanomaterials. A second mirror structure is formed on the second transparent material layer.


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