The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Aug. 26, 2016
Applicant:
Fm Industries, Inc., Fremont, CA (US);
Inventors:
Mahmood Naim, Poughkeepsie, NY (US);
David Hammerich, Fremont, CA (US);
Assignee:
FM Industries, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 4/134 (2016.01); C23C 4/11 (2016.01); C23C 4/02 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); C23C 4/02 (2013.01); C23C 4/11 (2016.01); C23C 4/134 (2016.01);
Abstract
A semiconductor processing member is provided, including a body and a plasma spray coating provided on the body. The coating is an ABO or ABCO complex oxide solid solution composition, where A, B and C are selected from the group consisting of La, Zr, Ce, Gd, Y, Yb and Si, and O is an oxide. The coating imparts both chlorine and fluorine plasma erosion resistance, reduces particle generation during plasma etching, and prevents spalling of the coating during wet cleaning of the semiconductor processing member.