The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
May. 03, 2017
Amazon Technologies, Inc., Seattle, WA (US);
Ramya Gopalan, Santa Clara, CA (US);
Carlo Murgia, Santa Clara, CA (US);
Sridhar Pilli, Fremont, CA (US);
Amazon Technologies, inc., Seattle, WA (US);
Abstract
A system configured to improve speech quality by performing residual echo suppression (RES). The system may detect when double talk is present in a voice conversation and may use different attenuation parameters based on a frequency of audio data. The system may perform RES on the audio data using a low attenuation value for low frequencies and a high attenuation value for high frequencies and determine that double talk is present when a difference in energy level between the low frequencies and the high frequencies is below a threshold. If double talk is present, the RES may generate output audio data using a low attenuation value for low frequencies and a high attenuation value for high frequencies. If double talk is not present, the RES may generate output audio data using a high attenuation value for low frequencies and a high attenuation value for high frequencies.