The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Feb. 06, 2015
Applicant:
Korea Institute of Machinery & Materials, Daejeon, KR;
Inventors:
Ji-Whan Noh, Daejeon, KR;
Hee-Shin Kang, Daejeon, KR;
Hyon Kee Sohn, Daejeon, KR;
Jeng-O Kim, Daejeon, KR;
Assignee:
KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G07D 7/12 (2016.01); B23K 26/359 (2014.01); G07D 7/06 (2006.01); B42D 25/328 (2014.01); B42D 25/41 (2014.01); B42D 25/324 (2014.01); B23K 26/362 (2014.01); G06K 9/20 (2006.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G07D 7/12 (2013.01); B23K 26/359 (2015.10); B23K 26/362 (2013.01); B42D 25/324 (2014.10); B42D 25/328 (2014.10); B42D 25/41 (2014.10); G06K 9/2036 (2013.01); G06K 9/4671 (2013.01); G07D 7/06 (2013.01);
Abstract
The present invention provides an anti-counterfeiting pattern processing apparatus and a method thereof that quickly process the anti-counterfeiting pattern with a low cost by forming a fine pattern of a nanometer or micrometer scale by using a laser processing system, and an apparatus and a method thereof detecting the anti-counterfeiting pattern of the micrometer or nanometer scale by using a laser measuring system.