The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

May. 18, 2017
Applicant:

National Chiao Tung University, Hsinchu, TW;

Inventors:

Jen-Hui Chuang, Hsinchu, TW;

Yong-Sheng Chen, Taipei, TW;

Mu-Tien Lu, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/80 (2017.01); H04N 13/246 (2018.01); H04N 13/239 (2018.01);
U.S. Cl.
CPC ...
G06T 7/85 (2017.01); H04N 13/239 (2018.05); H04N 13/246 (2018.05); G06T 2207/30208 (2013.01);
Abstract

A method for estimating epipolar geometry and to be performed by a processing module includes the steps of: A) choosing, in each first and third images captured by a first image capturing module, two points which are collinear with a corresponding one of a first reference object in the first image and a second reference object in the third image, such that in each second and fourth images captured by a second image capturing module, two points corresponding to the two points chosen in a respective one of the first and third images are collinear with a corresponding one of the first reference object in the second image and the second reference object in the fourth image; and B) determining first and second epipoles based on the aforementioned points.


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