The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Jun. 28, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sreekar Bhaviripudi, Sunnyvale, CA (US);

Shreekant Gayaka, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/62 (2006.01); G06N 3/08 (2006.01); G06N 3/04 (2006.01); G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
G06K 9/6267 (2013.01); G06K 9/4628 (2013.01); G06K 9/6256 (2013.01); G06K 9/6271 (2013.01); G06N 3/04 (2013.01); G06N 3/08 (2013.01);
Abstract

A method of classifying substrates with a metrology tool is herein disclosed. The method begins by training a deep learning framework using convolutional neural networks with a training dataset for classifying image dataset. Obtaining a new image from the meteorology tool. Running the new image through the deep learning framework to classify the new image.


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Bhaviripudi, Sreekar. (2019). Classification, search and retrieval of semiconductor processing metrology images using deep learning/convolutional neural networks (U.S. Patent No. 10387755). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10387755

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