The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

May. 23, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Rajiv V. Joshi, Yorktown Heights, NY (US);

Rouwaida N. Kanj, Round Rock, TX (US);

Sani R. Nassif, Austin, TX (US);

Carl J. Radens, LaGrangeville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01); G06F 11/07 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 11/076 (2013.01); G06F 11/008 (2013.01); G06F 11/079 (2013.01); G06F 17/5022 (2013.01); G06F 17/5009 (2013.01); G06F 2217/10 (2013.01);
Abstract

A mechanism is provided for reusing importance sampling for efficient cell failure rate estimation of process variations and other design considerations. First, the mechanism performs a search across circuit parameters to determine failures with respect to a set of performance variables. For a single failure region, the initial search may be a uniform sampling of the parameter space. Mixture importance sampling (MIS) efficiently may estimate the single failure region. The mechanism then finds a center of gravity for each metric and finds importance samples. Then, for each new origin corresponding to a process variation or other design consideration, the mechanism finds a suitable projection and recomputes new importance sampling (IS) ratios.


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