The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2019

Filed:

Feb. 28, 2018
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventor:

Takuya Mizutani, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 9/00 (2006.01); H01L 21/68 (2006.01); H01L 21/027 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7026 (2013.01); G03F 7/2002 (2013.01); G03F 7/70525 (2013.01); G03F 7/70641 (2013.01); G03F 9/7034 (2013.01); H01L 21/0274 (2013.01); H01L 21/681 (2013.01);
Abstract

According to one embodiment, an exposure apparatus performs exposure to transcribe a circuit pattern onto each of a plurality of sections on a wafer. The exposure apparatus includes a measurement device and a control device. The control device sets, on each of a first section and a second section adjacent to each other among the plurality of sections, a measurement point at a position offset from a reference position of each section. The control device causes the measurement device to measure surface information at each measurement point. The control device executes focus leveling control for exposure on the basis of the surface information measured at each measurement point.


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