The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
May. 23, 2017
Emagin Corporation, Hopewell Junction, NY (US);
Amalkumar P. Ghosh, Hopewell Junction, NY (US);
Fridrich Vazan, Pittsford, NY (US);
Munisamy Anandan, Austin, TX (US);
Evan Donoghue, Hopewell Juntion, NY (US);
Ilyas I. Khayrullin, Hopewell Junction, NY (US);
Tariq Ali, Hopewell Junction, NY (US);
Kerry Tice, Hopewell Junction, NY (US);
eMagin Corporation, Hopewell Junction, NY (US);
Abstract
A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask.