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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10386310 B1

PDFFull Text
Date of Patent:
Aug. 20, 2019

Filed:

Aug. 28, 2015

System for measuring levels of radiation reflecting from semiconductor material for use in measuring the dopant content thereof

Applicant:

Aurora Solar Technologies (Canada) Inc., North Vancouver, CA;

Inventor:

Stephen Warren Blaine, West Vancouver, CA;

Assignee:

Aurora Solar Technologies (Canada) Inc., North Vancouver, CA;

Attorney:

Norton Rose Fulbright Canada LLP

Primary Examiner:

David P Porta

Assistant Examiner:

Shun Lee

Int. Cl.
CPC ...
G01J 3/433 (2006.01); G01N 21/95 (2006.01); H01L 31/18 (2006.01); G01J 3/02 (2006.01); G01N 21/55 (2014.01); H01L 21/66 (2006.01); G01N 21/3563 (2014.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01J 3/0254 (2013.01); G01J 3/433 (2013.01); G01N 21/3563 (2013.01); G01N 21/55 (2013.01); G01N 21/9505 (2013.01); H01L 22/12 (2013.01); H01L 31/18 (2013.01); G01N 2021/3568 (2013.01); G01N 2201/062 (2013.01); G01N 2201/065 (2013.01); G01N 2201/06113 (2013.01);
Abstract

A system and method of non-contact measurement of the dopant content of semiconductor material by reflecting infrared (IR) radiation off of the material into an integrating sphere to scatter the received radiation and passing portions of the radiation through band pass filters of differing wavelength ranges, comparing the level of energy passed through each filter and calculating the dopant content by referencing a correlation curve made up of known wafer dopant content for that system.

Find Patent Forward Citations

Blaine, Stephen. (2019). System for measuring levels of radiation reflecting from semiconductor material for use in measuring the dopant content thereof (U.S. Patent No. 10386310). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10386310

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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