The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Jun. 06, 2017
Applicant:
Ih Ip Holdings Limited, St. Helier, GB;
Inventor:
Dennis G. Letts, Austin, TX (US);
Assignee:
IH IP Holdings Limited, St. Helier, JE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01); C25D 3/48 (2006.01); C25D 5/16 (2006.01); C25D 3/50 (2006.01); C25D 3/56 (2006.01); G21B 3/00 (2006.01); C25D 5/10 (2006.01); C25D 7/04 (2006.01); B01J 12/00 (2006.01); B01J 37/34 (2006.01); B01J 19/12 (2006.01);
U.S. Cl.
CPC ...
C25D 3/56 (2013.01); C25D 5/10 (2013.01); C25D 7/04 (2013.01); G21B 3/00 (2013.01); B01J 12/002 (2013.01); B01J 19/12 (2013.01); B01J 37/34 (2013.01); B01J 37/341 (2013.01); B01J 37/349 (2013.01); B01J 2219/00635 (2013.01); B01J 2219/0807 (2013.01); B01J 2219/0875 (2013.01); B01J 2219/0894 (2013.01); B01J 2219/0896 (2013.01); B01J 2219/0898 (2013.01);
Abstract
An exothermic reaction of hydrogen/deuterium loaded into a metal or alloy is triggered by controlling the frequency of a hydrogen/deuterium plasma in a reaction chamber. The plasma frequency is controlled by adjusting its electron density, which in turn is controlled by adjusting the pressure within the reaction chamber. An exothermic reaction is generated at certain discrete plasma frequencies, which correspond to the optical phonon modes of D-D, H-D, and H—H bonds within the metal lattice. For example, in palladium metal, the frequencies are 8.5 THz, 15 THz, and 20 THz, respectively.