The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Apr. 08, 2016
Applicant:
Osaka University, Suita-shi, JP;
Inventors:
Assignee:
Osaka University, Suita-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); B29C 73/18 (2006.01); C08F 2/10 (2006.01); C08F 4/40 (2006.01); C08F 220/58 (2006.01); C08F 16/02 (2006.01); C08F 22/10 (2006.01); C08F 22/38 (2006.01); C08L 33/26 (2006.01);
U.S. Cl.
CPC ...
B29C 73/18 (2013.01); C08F 2/10 (2013.01); C08F 2/46 (2013.01); C08F 4/40 (2013.01); C08F 16/02 (2013.01); C08F 22/105 (2013.01); C08F 22/38 (2013.01); C08F 220/58 (2013.01); C08L 33/26 (2013.01);
Abstract
The present invention provides a self-repairing material having self-repairing properties and shape memory properties, as well as high dynamic strength, and also provides a method for manufacturing the same. The self-repairing material of the present invention comprises a polymer comprising specific monomer units in specific ratios, and the concentration of the monomer units is within a specific range.