The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

May. 09, 2018
Applicant:

Nichia Corporation, Anan-shi, Tokushima, JP;

Inventor:

Masanao Ochiai, Tokushima, JP;

Assignee:

NICHIA CORPORATION, Anan-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/02 (2006.01); H01S 5/343 (2006.01); H01S 5/183 (2006.01); H01S 5/042 (2006.01); H01S 5/028 (2006.01); H01S 5/22 (2006.01); H01S 5/20 (2006.01); H01S 5/00 (2006.01);
U.S. Cl.
CPC ...
H01S 5/0285 (2013.01); H01S 5/0014 (2013.01); H01S 5/0213 (2013.01); H01S 5/0287 (2013.01); H01S 5/0425 (2013.01); H01S 5/18369 (2013.01); H01S 5/2086 (2013.01); H01S 5/34333 (2013.01); H01S 5/0202 (2013.01); H01S 5/22 (2013.01);
Abstract

A method of manufacturing a semiconductor laser element includes: providing a nitride semiconductor structure with a target emission wavelength λo, the nitride semiconductor structure having a light emission-side surface and a light reflection-side surface; forming an emission-side mirror on the light emission-side surface; and forming a reflection-side mirror on the light reflection-side surface. The semiconductor laser element has an actual wavelength λa, which is 500 nm or more and is in a range of λo±X nm (5≤X≤15). A reflectance of the emission-side mirror is lower than a reflectance of the reflection-side mirror and increases in accordance with an increase in wavelength in a range of λo±X nm.


Find Patent Forward Citations

Ochiai, Masanao. (2019). Semiconductor laser element and method of manufacturing the same (U.S. Patent No. 10381800). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10381800

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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