The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Nov. 10, 2016
Novatek Microelectronics Corp., Hsinchu, TW;
Xiao-Na Xie, ShaanXi Province, CN;
Kai Kang, ShaanXi Province, CN;
Jian-Hua Liang, ShaanXi Province, CN;
Yuan-Jia Du, Shandong Province, CN;
Novatek Microelectronics Corp., Hsinchu, TW;
Abstract
The disclosure proposes a method of texture synthesis and an apparatus using the same. In one of the exemplary embodiments, the step of generating the first single scale detail image would include not limited to: performing a feature extraction of a first pixel block of an image frame to derive a first pixel feature, applying a first criteria to the first pixel feature to derive a positive result, performing a first detail alignment and a maximum extension of the positive result to derived an adjusted positive mapping result, applying a second criteria, which is opposite to the first criteria, to the first pixel feature to derive a negative result, performing a second detail alignment and a minimum extension of the negative result to derived an adjusted negative mapping result, and blending the adjusted positive mapping result and the adjusted negative mapping result to generate the first single scale detail image.