The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

Jun. 27, 2017
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Hideya Arimura, Shizuoka, JP;

Shohei Urushihara, Suntou-gun, JP;

Masaki Yamada, Mishima, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/08 (2006.01); G03G 15/02 (2006.01); G03G 21/00 (2006.01); G03G 15/16 (2006.01);
U.S. Cl.
CPC ...
G03G 15/0808 (2013.01); G03G 15/0233 (2013.01); G03G 15/0812 (2013.01); G03G 15/0818 (2013.01); G03G 21/0017 (2013.01); G03G 15/1685 (2013.01);
Abstract

Provided is an electrophotographic member including an electro-conductive substrate and a surface layer on the substrate. The surface layer contains a urethane resin and a first polymer having a specific nitrogen-containing structure. The urethane resin has a structure derived from a second polymer containing a fluorine atom or a structure derived from a third polymer containing a fluorine atom and a silicon atom. The surface layer contains nitrogen atoms derived from the nitrogen-containing structure at a specific ratio in a region from the outer surface of the surface layer to a depth of 300 nm, and the atomic ratios of nitrogen atoms, fluorine atoms, and silicon atoms in a region from a depth of 100 nm from the outer surface of the surface layer to a depth of 300 nm and a region from the outer surface to a depth of 10 nm have specific relationships.


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