The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

Nov. 14, 2018
Applicant:

National Tsing Hua University, Hsinchu, TW;

Inventors:

Ming-Chang Chen, Hsinchu, TW;

Hung-Wei Sun, Taoyuan, TW;

Pei-Chi Huang, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/35 (2006.01);
U.S. Cl.
CPC ...
G02F 1/3544 (2013.01); G02F 1/3501 (2013.01); G02F 1/353 (2013.01); G02F 2001/3503 (2013.01); G02F 2001/354 (2013.01); G02F 2201/58 (2013.01);
Abstract

A method and system for utilizing the laser defocusing effect for phase matching of high order harmonic generation in a tight focusing geometry are provided. The most suitable focusing geometry, especially those five parameters including: (1) the aperture size of the adjustable iris, (2) the focus position with respect to the gas cell, (3) the backing pressure of the gas cell, (4) the focal length and (5) the length of the gas cell, for achieving phase matching of the target harmonic order and maximal yield of the target harmonic order are disclosed.


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Chen, Ming-Chang. (2019). High order harmonic generation optimization system and method in tight focusing geometry (U.S. Patent No. 10379421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10379421

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