The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2019
Filed:
Nov. 10, 2017
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Hyo Sun Lee, Daejeon, KR;
Ho Young Kim, Hwaseong-si, KR;
Sang Won Bae, Suwon-si, KR;
Min Goo Kim, Seoul, KR;
Jung Hun Lim, Daejeon, KR;
Yong Jae Choi, Gyeongsangbuk-do, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Soulbrain Co., Ltd., Gyeonggi-do, KR;
Abstract
An etching composition selectively removes a titanium nitride film from a stacked conductive film structure including a titanium nitride (TiN) film and a tantalum nitride (TaN) film. The etching composition configured to etch titanium nitride (TiN) includes 5 wt % to 30 wt % of hydrogen peroxide, 15 wt % to 50 wt % of acid compound, and 0.001 wt % to 5 wt % of corrosion inhibitor, with respect to a total weight of the etching composition, wherein the acid compound includes at least one of phosphoric acid (HPO), nitric acid (HNO), hydrochloric acid (HCl), hydroiodic acid (HI), hydrobromic acid (HBr), perchloric acid (HNO), silicic acid (HSiO), boric acid (HBO), acetic acid (CHCOOH), propionic acid (CHCOOH), lactic acid (CHCH(OH)COOH), and glycolic acid (HOCHCOOH).