The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2019

Filed:

Nov. 14, 2017
Applicant:

Dupont Teijin Films U.s. Limited Partnership, Wilmington, DE (US);

Inventors:

Stephen William Sankey, Redcar, GB;

David Turner, Redcar, GB;

Howard Colquhoun, Reading, GB;

Stephen Jones, Reading, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/16 (2006.01); C08G 63/88 (2006.01); C08J 5/18 (2006.01); C08G 63/685 (2006.01); C08G 73/10 (2006.01); C08L 79/08 (2006.01); D01F 6/84 (2006.01);
U.S. Cl.
CPC ...
C08G 73/16 (2013.01); C08G 63/6856 (2013.01); C08G 63/88 (2013.01); C08G 73/1082 (2013.01); C08J 5/18 (2013.01); C08L 79/08 (2013.01); D01F 6/84 (2013.01); C08J 2367/02 (2013.01); C08J 2379/08 (2013.01);
Abstract

A copolyester includes repeating units derived from an aliphatic glycol, terephthalic acid, and the monomer of formula (I): wherein n=2, 3 or 4; Z is C═O; comonomer (I) constitutes a proportion of the glycol fraction of the copolyester and is present in a range of from about 5 to about 15 mol % of the glycol fraction of the copolyester; wherein said copolyester is semi-crystalline. A process tor making the copolyester includes annealing a copolyester of formula (I) at 20-80° C. below the crystalline melting point (Tm) and above the glass transition temperature (Tg).


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