The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Oct. 28, 2016
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Katarzyna Kowalik-Seidl, Munich, DE;

Bjoern Fischer, Munich, DE;

Winfried Kaindl, Unterhaching, DE;

Markus Schmitt, Neubiberg, DE;

Matthias Wegscheider, Villach, AT;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 29/06 (2006.01); H01L 29/739 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 21/225 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66333 (2013.01); H01L 21/26586 (2013.01); H01L 29/0634 (2013.01); H01L 29/66719 (2013.01); H01L 29/66727 (2013.01); H01L 29/7395 (2013.01); H01L 21/2253 (2013.01); H01L 29/0696 (2013.01); H01L 29/0865 (2013.01); H01L 29/1095 (2013.01);
Abstract

Disclosed is a method for producing a transistor device and a transistor device. The method includes: forming a source region of a first doping type in a body region of a second doping type in a semiconductor body; and forming a low-resistance region of the second doping type adjoining the source region in the body region. Forming the source region includes implanting dopant particles of the first doping type using an implantation mask via a first surface of the semiconductor body into the body region. Implanting the doping particles of the first doping type includes a tilted implantation.


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