The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2019
Filed:
Aug. 04, 2015
Ii-vi Incorporated, Saxonburg, PA (US);
Wen-Qing Xu, Medfield, MA (US);
Chao Liu, Butler, PA (US);
Charles J. Kraisinger, Saxonburg, PA (US);
Charles D. Tanner, Saxonburg, PA (US);
Ian Currier, Butler, PA (US);
David Sabens, Harmony, PA (US);
Elgin E. Eissler, Renfrew, PA (US);
Thomas E. Anderson, Morristown, NJ (US);
II-VI Incorporated, Saxonburg, PA (US);
Abstract
In a method of chemical vapor deposition (CVD) growth of a polycrystalline diamond film in a CVD reactor, a gas mixture of gaseous hydrogen and a gaseous hydrocarbon is introduced into the CVD reactor. A plasma formed from the gas mixture is maintained above a surface of a conductive substrate disposed in the CVD reactor and causes a polycrystalline diamond film to grow on the surface of the conductive substrate. A temperature T at the center of the polycrystalline diamond film is controlled during growth of the polycrystalline diamond film. The CVD grown polycrystalline diamond film includes diamond crystallites that can have a percentage of orientation along a [110] diamond lattice direction≥70% of the total number of diamond crystallites forming the polycrystalline diamond film.