The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Dec. 21, 2016
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

David Stephen Reiner, Lexington, MA (US);

Kenneth Moore, Cork, IE;

John Yani Arrasjid, Boulder Creek, CA (US);

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/21 (2019.01); G06F 16/22 (2019.01); G06F 16/248 (2019.01);
U.S. Cl.
CPC ...
G06F 16/212 (2019.01); G06F 16/22 (2019.01); G06F 16/248 (2019.01);
Abstract

An apparatus in one embodiment comprises a processing platform comprising one or more processing devices. The processing platform implements a database configured to store metric and level information for each of a plurality of models, and a metric mapper adapted to interface with the database. The metric mapper is configured to utilize the metric and level information stored in the database to establish an association between a first metric characterizing at least one of a workload and a resource in accordance with a first one of the models and a second metric characterizing at least one of a workload and a resource in accordance with a second one of the models. The established association is illustratively applied to relate service requirements specified at least in part using the first metric of the first model to service capabilities specified at least in part using the second metric of the second model.


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