The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2019
Filed:
Mar. 28, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Takahiro Nakayama, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising: a generator configured to generate ionized gas by ionizing a first gas; a supplier configured to supply a second gas including the ionized gas generated by the generator to a space under the mold; and a controller configured to control a flow rate of the second gas supplied by the supplier to the space, wherein the controller increases the flow rate of the second gas supplied from the supplier to the space so as to reduce a decrease in an ion concentration in the space caused by moving the substrate from the space after the mold is separated from the cured imprint material.