The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2019
Filed:
Jan. 30, 2017
G. David Tubb, Canadian, TX (US);
G. David Tubb, Canadian, TX (US);
Other;
Abstract
An improved aim compensation method using ballistic effect compensating reticleincludes choosing, for a user-selected target, corresponding spin-drift compensated Point of Aim (POA) within a multiple point elevation and windage aim point field (e.g.,) including a primary aiming mark (e.g.,) aligned horizontally with left and right leveling reference lines (e.g.,L,R) which point inwardly to the primary aiming point to be sighted-in at a first selected range. The aim point field also includes a plurality of secondary downrange aiming points arrayed beneath the primary aiming mark, and the downrange aiming points are arrayed in lines of dots or downrange windage hold points positioned to compensate for ballistic effects such as spin drift.