The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2019

Filed:

Sep. 30, 2014
Applicant:

Schlumberger Technology Corporation, Sugar Land, TX (US);

Inventors:

Keli Sun, Sugar Land, TX (US);

Dzevat Omeragic, Lexington, MA (US);

Steve F. Crary, Al-Khobar, SA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/18 (2006.01); G01V 3/26 (2006.01); G01V 3/38 (2006.01); E21B 49/00 (2006.01); G01V 99/00 (2009.01); E21B 47/022 (2012.01);
U.S. Cl.
CPC ...
E21B 49/00 (2013.01); E21B 47/02216 (2013.01); G01V 3/18 (2013.01); G01V 3/26 (2013.01); G01V 3/38 (2013.01); G01V 99/005 (2013.01);
Abstract

Techniques for log squaring using both directional and non-directional electromagnetic measurements are disclosed. The techniques described herein can be used for determining bed boundary locations and assigning resistivity values to each layer in a layered earth model, regardless of well deviation. Potential bed boundary locations can be derived from both directional and non-directional electromagnetic measurement data. The bed boundary locations from the directional and non-directional measurements can then be consolidated using a weighted averaging scheme, where weight can be dependent based on apparent formation dip. By combining the results from both directional and non-directional measurements, the log squaring techniques described herein can be used in most wells regardless of the well angle (the angle can be arbitrary). Once bed boundaries are selected, formation properties, such as horizontal resistivity (Rh) and vertical resistivity (Rv) can be assigned to the model layers.


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