The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Mar. 13, 2015
Screen Holdings Co., Ltd., Kyoto, JP;
Takeshi Yoshida, Kyoto, JP;
SCREEN Holdings Co., Ltd., , JP;
Abstract
In a substrate processing apparatus, gas is supplied from above a shield plate to a lid internal space within a chamber so that pressure in the lid internal space becomes higher than pressure in a chamber-body internal space and the gas in the lid internal space is sent to the chamber-body internal space. The gas flowing from the lid internal space is discharged through a body discharge port provided below a substrate in the chamber-body internal space. This forms a generally cylindrical current of gas in the chamber. The supply of processing liquids to an upper surface of the substrate is conducted on the inner side of the generally cylindrical current. This suppresses mists and fumes of processing liquids passing through the generally cylindrical current and entering into the lid internal space from the gap between the shield plate and the lid bottom part.