The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2019

Filed:

Mar. 27, 2018
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Shinya Takashima, Hachioji, JP;

Katsunori Ueno, Matsumoto, JP;

Masaharu Edo, Tokorozawa, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/207 (2006.01); H01L 21/225 (2006.01); H01L 29/20 (2006.01); H01L 29/66 (2006.01); H01L 21/265 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 21/266 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2258 (2013.01); H01L 21/266 (2013.01); H01L 21/26553 (2013.01); H01L 29/086 (2013.01); H01L 29/1095 (2013.01); H01L 29/2003 (2013.01); H01L 29/207 (2013.01); H01L 29/66522 (2013.01); H01L 29/66712 (2013.01); H01L 29/7802 (2013.01);
Abstract

A vertical semiconductor apparatus includes: a gallium nitride substrate; a gallium nitride semiconductor layer on the gallium nitride substrate; a p-type impurity region in the gallium nitride semiconductor layer and having an element to function as an acceptor for gallium nitride; an n-type impurity region in the p-type impurity region and having an element to function as a donor for gallium nitride; and an electrode provided contacting a rear surface of the gallium nitride substrate. The element to function as the donor in the n-type impurity region includes: a first impurity element to enter sites of gallium atoms in the gallium nitride semiconductor layer; and a second impurity element different from the first impurity element and to enter sites of nitrogen atoms in the gallium nitride semiconductor layer. In the n-type impurity region, a concentration of the first impurity element is higher than that of the second impurity element.


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