The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Feb. 28, 2017
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Seiji Morita, Shinagawa Tokyo, JP;
Masahiro Kanno, Yokohama Kanagawa, JP;
Yusuke Kasahara, Yokohama Kanagawa, JP;
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); C09D 5/00 (2006.01); C08F 293/00 (2006.01); C09D 153/00 (2006.01); H01L 21/02 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); C08F 293/005 (2013.01); C09D 5/00 (2013.01); C09D 153/00 (2013.01); H01L 21/02118 (2013.01); H01L 21/31058 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01);
Abstract
According to one embodiment, a pattern forming method includes supplying, onto an under layer, a self-organization material including a block copolymer which includes a first polymer and a second polymer, and a third polymer having a molecular structure with oxygen attached to a cyclic structure, wherein the third polymer is bonded to the first polymer, and phase-separating the block copolymer to form a phase-separation pattern on the under layer.