The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Aug. 01, 2018
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G03F 7/16 (2006.01); B05D 1/00 (2006.01); G03F 7/00 (2006.01); G03F 7/11 (2006.01); H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); B05D 1/005 (2013.01); G03F 7/0035 (2013.01); G03F 7/11 (2013.01); G03F 7/161 (2013.01); H01L 21/00 (2013.01); H01L 21/6715 (2013.01);
Abstract
Provided is a film formation method including the steps of: forming a resist film on an object to be applied, forming a layer of a protecting material removable by a first dissolving liquid on the upper surface of the resist film, removing the resist film from a region not having, on the upper surface thereof, the layer of the protecting material by side rinsing with a second dissolving liquid capable of dissolving the resist film therein, and removing the protecting material remaining on the upper surface of the resist film by the first dissolving liquid.