The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2019

Filed:

Jul. 17, 2017
Applicant:

Ushio Denki Kabushiki Kaisha, Tokyo, JP;

Inventors:

Masashi Okamoto, Tokyo, JP;

Tsukasa Matsuo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 9/02 (2006.01); G01B 9/021 (2006.01); G01M 11/02 (2006.01); G03H 1/08 (2006.01); G03H 1/04 (2006.01); G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
G01J 9/02 (2013.01); G01B 9/021 (2013.01); G01B 9/02032 (2013.01); G01B 9/02047 (2013.01); G01M 11/0271 (2013.01); G03H 1/0443 (2013.01); G03H 1/0866 (2013.01); G03H 2001/045 (2013.01); G03H 2001/0445 (2013.01);
Abstract

When an optical system is illuminated with illumination light fluxes emitted from respective input image points, an interference image generated by superimposing output light fluxes output from the optical system and a reference light flux coherent with the output light fluxes is imaged to acquire interference image data collectively including information of an interference image about all input image points. Diffractive optical light propagation simulation is performed to acquire a phase distribution associated with only light emitted from a single input image point at a position where reconstructed light fluxes to the respective output light fluxes are separated into each light flux. In each input image point, this simulation is performed to acquire a phase distribution on an exit pupil plane.


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