The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Jan. 06, 2016
Applicant:
Corning Incorporated, Corning, NY (US);
Inventors:
Baifeng Chen, Shanghai, CN;
Haixing Chen, Shanghai, CN;
Ling Chen, Shanghai, CN;
Haofei Gong, Shanghai, CN;
Jun Hou, Painted Post, NY (US);
Assignee:
CORNING INCORPORATED, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01);
U.S. Cl.
CPC ...
C03C 15/00 (2013.01);
Abstract
An apparatus for producing anti-glare surfaces includes an etching cream dipping tank and a sub-tank arranged to receive a slurry of etching cream. A pumping unit is fluidly coupled to the etching cream dipping tank and the sub-tank such that the pumping unit is operable to selectively self-circulate the slurry of etching cream in the sub-tank to improve homogeneity of the etching cream and transfer a volume of the homogenized etching cream from the sub-tank to the etching cream dipping tank.