The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Aug. 26, 2011
Xiao B. Yun, Beijing, CN;
Rongjuan Cong, Lake Jackson, TX (US);
Jephrey Pan, Beijing, CN;
Teresa P. Karjala, Lake Jackson, TX (US);
Xiao B. Yun, Beijing, CN;
Rongjuan Cong, Lake Jackson, TX (US);
Jephrey Pan, Beijing, CN;
Teresa P. Karjala, Lake Jackson, TX (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
The present invention discloses a process for forming a biaxially oriented film. The process includes first selecting a polyolefin resin wherein said polyolefin resin comprises a linear low density polyethylene resin characterized by having from 9 to 35 weight percent of the total weight of linear low density polyethylene resin eluting from a CEF at a temperature greater than 97.0° C.; and further characterized by having a CDR of from 33 to 80 and a Mw Ratio of from 0.15 to 0.45. Next a film is formed from the polyolefin resin selected in the first step. Finally the film formed in the second step is oriented in a sequential manner. The films produced by this process are characterized by having an ultimate elongation at least 1.5 times greater in the MD as compared to the CD and the 2% secant modulus is a least 1.25 times greater in the CD as compared to the MD. The films are further characterized by having free residual shrinkage of less than 10% in the MD and less than 10% in the CD when exposed to a temperature of 90° C. for 10 minutes.