The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2019

Filed:

May. 18, 2015
Applicant:

Feng LI, Guangdong, CN;

Inventor:

Feng Li, Guangdong, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 41/22 (2006.01); B29C 41/04 (2006.01); H01L 33/50 (2010.01); F21K 9/64 (2016.01); F21Y 115/10 (2016.01); B29K 83/00 (2006.01); B29L 31/34 (2006.01); F21V 9/30 (2018.01);
U.S. Cl.
CPC ...
B29C 41/22 (2013.01); B29C 41/04 (2013.01); H01L 33/505 (2013.01); B29K 2083/00 (2013.01); B29K 2995/0035 (2013.01); B29L 2031/3406 (2013.01); F21K 9/64 (2016.08); F21V 9/30 (2018.02); F21Y 2115/10 (2016.08); H01L 33/508 (2013.01); H01L 2933/0041 (2013.01);
Abstract

A method of manufacturing a fluorescent silicone film contains: steps of: A. mixing optical silicone and fluorescent powders so as to produce a mixture, and adding liquid to the mixture; B. vacuuming, degassing and feeding the mixture into an accommodation cavity of a mold; C. placing the mold into a planetary centrifugal mixer so as to centrifuge the mixture; D. forming the fluorescent silicone film in the accommodation cavity; and E. solidifying and removing the fluorescent silicone film from the mold. In the step of A, the optical silicone and the fluorescent powders are mixed at a ratio of 100:10 to 100:25. In the step of B, the accommodation cavity is closed after feeding the mixture. In the step of D, the fluorescent silicone film has a silicone layer and a fluorescent powder layer which are formed in the accommodation cavity in a chemical vapor deposition (CVD) manner.


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