The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Feb. 20, 2015
Applicant:

Philips Photonics Gmbh, Ulm, DE;

Inventors:

Ulrich Weichmann, Aachen, DE;

Andreas Peter Engelhardt, Aachen, DE;

Johanna Sophie Kolb, Aachen, DE;

Marcel Franz Christian Schemmann, Maria Hoop, NL;

Holger Moench, Vaals, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01L 33/10 (2010.01); H01S 5/183 (2006.01); H01S 5/343 (2006.01); H01L 21/00 (2006.01); H01L 21/265 (2006.01); H01S 5/30 (2006.01); H01L 33/00 (2010.01); H01L 33/02 (2010.01); H01L 33/30 (2010.01); H01S 5/022 (2006.01); H01S 5/042 (2006.01); H01L 33/12 (2010.01);
U.S. Cl.
CPC ...
H01S 5/02204 (2013.01); H01L 33/0062 (2013.01); H01L 33/025 (2013.01); H01L 33/105 (2013.01); H01L 33/30 (2013.01); H01S 5/0425 (2013.01); H01S 5/18308 (2013.01); H01S 5/18361 (2013.01); H01S 5/305 (2013.01); H01L 33/12 (2013.01); H01S 5/0014 (2013.01); H01S 5/0021 (2013.01); H01S 5/3432 (2013.01); H01S 2301/173 (2013.01);
Abstract

The invention describes a light emitting semiconductor device () comprising a substrate (), a light emitting layer structure () and an AlGaAs getter layer () for reducing an impurity in the light emitting layer structure (), the light emitting layer structure () comprising an active layer () and layers of varying Aluminum content, wherein the growth conditions of the layers of the light emitting layer structure () comprising Aluminum are different in comparison to the growth conditions of the AlGaAs getter layer (). The AlGaAs getter layer () enables a reduction of the concentration of impurities like Sulfur etc. in the gas phase of a deposition equipment or growth reactor. The reduction of such impurities reduces the probability of incorporation of the impurities in the light emitting layer structure () which may affect the lifetime of the light emitting semiconductor device (). The growth conditions are chosen out of the group Arsenic partial pressure, Oxygen partial pressure, deposition temperature, total deposition pressure and deposition rate of Aluminum. The invention further relates to a corresponding method of manufacturing such a light emitting semiconductor device ().


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