The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Mar. 17, 2018
Littelfuse, Inc., Chicago, IL (US);
Kyoung Wook Seok, Milpitas, CA (US);
Littelfuse, Inc., Chicago, IL (US);
Abstract
A trench N-channel field effect transistor has an active area and an edge area. A first pair of parallel-extending deep trenches extends parallel to a side edge of the die. A second pair of parallel-extending deep trenches extends perpendicularly to the side edge, toward the side edge, so that each trench of the second pair terminates into the inside deep trench of the first pair. An embedded field plate structure is embedded in these trenches. A plurality of floating P type well regions is disposed entirely between the second pair of deep trenches, between the active area and the inside deep trench of the first pair. Using this edge area structure, the breakdown voltage BVof the overall device is increased because the breakdown voltage of the edge area is increased as compared to the same structure without the floating P type well regions.