The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Dec. 05, 2016
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Hyosan Lee, Suwon-si, KR;
Yongsun Ko, Suwon-si, KR;
Kyoungseob Kim, Suwon-si, KR;
Kwangsu Kim, Seoul, KR;
SeokHoon Kim, Seongnam-si, KR;
Kuntack Lee, Suwon-si, KR;
Yongmyung Jun, Hwaseong-si, KR;
Yong-Jhin Cho, Hwaseong-si, KR;
Abstract
A substrate treatment apparatus is provided. The apparatus may include a process chamber configured to have an internal space, a substrate supporting member disposed in the process chamber to support a substrate, a first supplying port configured to supply a supercritical fluid to a region of the internal space located below the substrate, a second supplying port configured to supply a supercritical fluid to other region of the internal space located over the substrate, and an exhaust port configured to exhaust the supercritical fluid from the process chamber to an exterior region.