The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Sep. 18, 2017
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
Sridhar Dubbaka, Eden Prairie, MN (US);
Sriram Viswanathan, Chanhassen, MN (US);
Christina Hutchinson, Eden Prairie, MN (US);
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/312 (2006.01); B44C 1/22 (2006.01); G11B 5/31 (2006.01); H01J 37/32 (2006.01); G11B 5/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32009 (2013.01); G11B 5/3116 (2013.01); G11B 5/3163 (2013.01); G11B 2005/0021 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
A method of forming a feature in a void, the method including filling the void having at least one sloped wall with a polymeric material; forming a layer of photoresist over the polymeric material; forming a gap in the layer of photoresist; and etching the polymeric material exposed by the gap in the layer of photoresist to form a feature.