The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Sep. 08, 2014
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventors:

Hiroshi Otsuka, Kawasaki, JP;

Yukihiro Watanabe, Kawasaki, JP;

Yasuhide Matsumoto, Kawasaki, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/30 (2006.01); G06F 11/07 (2006.01); G06F 11/34 (2006.01);
U.S. Cl.
CPC ...
G06F 11/0751 (2013.01); G06F 11/0706 (2013.01); G06F 11/3476 (2013.01);
Abstract

A determination method includes obtaining, from a computer, history information of change time points indicating times at which processing for making a change to a program is executed; determining a predetermined time interval indicating an interval of the change time points; determining a first time period later than a latest change time point extracted from the history information, and a second time period earlier than the first time period; obtaining, from the computer, log messages including history of operations and operation time points corresponding to the operations; extracting, from the log messages, a first appearance pattern indicating a pattern of operations that appeared in the first time period and a second appearance pattern indicating a pattern of operations that appeared in the second time period; and determining whether a failure occurred in the first time period, based on a difference between the first appearance pattern and the second appearance pattern.


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