The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Mar. 18, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshihito Tada, Utsunomiya, JP;
Noburu Takakura, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
Provided is a lithography apparatus that has a plurality of processing units each of which configured to perform processing of pattern formation for substrates. The lithography apparatus also has a controller configured to manage the plurality of processing units as groups in accordance with characteristics of the pattern formation respectively, allocate the substrates included in one or more lots to one of the groups, and, if an unprocessed substrate allocated to the group still exist upon a standby state of a processing unit included in the group, allocate the unprocessed substrate to the processing unit in the standby state and then cause the processing units to perform parallel processing for the substrates based on the allocation.