The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2019

Filed:

Oct. 16, 2014
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yosuke Murakami, Utsunomiya, JP;

Tatsuya Hayashi, Utsunomiya, JP;

Kazuki Nakagawa, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01); B29C 43/02 (2006.01); B29K 101/00 (2006.01); B29L 31/00 (2006.01); B29C 43/52 (2006.01); B29C 43/36 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 43/021 (2013.01); G03F 7/70425 (2013.01); G03F 7/70483 (2013.01); B29C 2043/025 (2013.01); B29C 2043/3634 (2013.01); B29C 2043/522 (2013.01); B29K 2101/00 (2013.01); B29L 2031/001 (2013.01); G03F 9/7019 (2013.01); G03F 2007/2067 (2013.01);
Abstract

The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by using a mold, the apparatus comprising a heating unit configured to heat a region to be imprinted on the substrate, thereby deforming the region, and a processing unit configured to determine, as a region to be imprinted first, one region out of a first region and second region to be imprinted, and determine the other region as a region to be imprinted subsequently, wherein an influence on the other region in a case where the heating unit deforms the one region is smaller than an influence on the one region in a case where the heating unit deforms the other region.


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