The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10358718 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 23, 2019

Filed:

Jan. 16, 2014
Applicant:

Universiteit Gent, Ghent, BE;

Inventors:

Christophe Detavernier, Denderleeuw, BE;

Davy Deduytsche, De Pinte, BE;

Amit Kumar Roy, Thakurpur, Kolkata, IN;

Assignee:

UNIVERSITEIT GENT, Ghent, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/02 (2006.01); C23C 16/40 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/403 (2013.01); C23C 16/02 (2013.01); C23C 16/40 (2013.01); C23C 16/407 (2013.01); C23C 16/45536 (2013.01); C23C 16/45555 (2013.01); C23C 16/52 (2013.01); Y10T 428/31544 (2015.04);
Abstract

A method is described for providing a hydrophilic effect to a fluoropolymer, e.g. polytetrafluoroethylene (PTFE) material. The method comprises obtaining an at least partly hydrophobic fluoropolymer material, applying a plasma and/or ozone activation step and depositing an inorganic coating using an atomic layer deposition process. Plasma activation step and/or said atomic layer deposition process thereby comprises using process parameters determining a high interaction probability between one or more precursors for the atomic layer deposition process and the fluoropolymer material so as to obtain a coated fluoropolymer material having a contact angle with water below 30°.


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