The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2019
Filed:
Feb. 28, 2017
Lvmh Recherche, Saint Jean de Braye, FR;
Valerie Alard, Orleans, FR;
Beatrice Beaufrere-Seron, Olivet, FR;
Eric Perrier, Les Cotes D'arey, FR;
Brigitte Noe, Orleans, FR;
LVMH RECHERCHE, Saint Jean de Braye, FR;
Abstract
The present invention relates to a method for protecting the skin against UV rays, using two cosmetic compositions for protecting against UV rays, the sun protection indices of which are different from each other, this method consisting in applying to the skin, before or during exposure to sunlight, a first composition having a certain sun protection index, and then in applying, during exposure to sunlight, onto the residual deposit of the first composition, the second cosmetic composition having a sun protection index lower than that of the first composition. This method advantageously makes it possible to not reapply the first composition, but to use a second product that is much more pleasant to use, while at the same time obtaining the level of protection afforded by the deposit of the initial first composition. The invention also relates to a sun protection kit comprising a first composition for protecting against UV rays having a sun protection index of greater than or equal to 30, and at least a second cosmetic composition for protecting against UV rays, having a sun protection index of less than or equal to 20, the two compositions being packaged separately.