The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Mar. 04, 2016
Mediatek (Beijing) Inc., Beijing, CN;
Yuanyuan Zhang, Beijing, CN;
Aimin Justin Sang, San Diego, CA (US);
MEDIATEK (Beijing) INC., Beijing, CN;
Abstract
Methods and apparatus are provided for enhanced mechanism for RRM measurement in the mmW system. In one novel aspect, the filtered-consolidation measurement result is generated for each cell. The UE measures multiple control beams in an mmW system. The UE either performs a layer-3 filtering on each of the measured control beams or on consolidation measurement results for each control beam of the cell. The UE generates the filtered-consolidation measurement results for each corresponding cell. In another novel aspect, an intra-cell threshold and an inter-cell threshold are configured, wherein the intra-cell threshold is greater than the inter-cell threshold. The UE obtains a consolidation measurement for the serving cell and compares the result with the two preconfigured thresholds. The UE performs different level of control beam measurements based on the comparison of the consolidation measurement of the serving and the two thresholds.