The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

Jul. 23, 2018
Applicant:

Amazing Microelectronic Corp., New Taipei, TW;

Inventors:

Chih-Ting Yeh, Hsinchu County, TW;

Sung-Chih Huang, Yilan County, TW;

Che-Hao Chuang, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/866 (2006.01); H01L 23/34 (2006.01); H01L 27/02 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/866 (2013.01); H01L 23/34 (2013.01); H01L 27/0255 (2013.01); H01L 29/0692 (2013.01); H01L 29/66106 (2013.01);
Abstract

A heat-dissipating Zener diode includes a heavily-doped semiconductor substrate having a first conductivity type, a first epitaxial layer having the first conductivity type, a first heavily-doped area having a second conductivity type, a second epitaxial layer, and a second heavily-doped area having the second conductivity type or the first conductivity type. The first epitaxial layer is formed on the heavily-doped semiconductor substrate. The first heavily-doped area is formed in the first epitaxial layer and spaced from the heavily-doped semiconductor substrate. The second epitaxial layer is formed on the first epitaxial layer and penetrated with a first doped area, and the first doped area has the second conductivity type and contacts the first heavily-doped area. The second heavily-doped area is formed in the first doped area.


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